DocumentCode :
905607
Title :
An integrated metal-nitride-oxide-silicon (MNOS) memory
Author :
Frohman-Bentchkowsky, D.
Volume :
57
Issue :
6
fYear :
1969
fDate :
6/1/1969 12:00:00 AM
Firstpage :
1190
Lastpage :
1192
Abstract :
A nonvolatile integrated metal-nitride-oxide-silicon (MNOS) word organized memory was fabricated. The salient features of this integrated storage array are 1) WRITE cycle 2.0 microseconds, READ cycle 500 nanoseconds, 2) WRITE voltage ± 25V, 3) single device per storage bit, 4) MOS driving circuitry with no isolation between MOS and MNOS devices on the same chip, and 5) nonvolatile storage of information.
Keywords :
Circuits; Electron devices; Equations; Finite wordlength effects; Hysteresis; Nanoscale devices; Nonvolatile memory; Time factors; Transient response; Voltage;
fLanguage :
English
Journal_Title :
Proceedings of the IEEE
Publisher :
ieee
ISSN :
0018-9219
Type :
jour
DOI :
10.1109/PROC.1969.7185
Filename :
1449115
Link To Document :
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