DocumentCode :
906476
Title :
Position-Sensitive Germanium Detectors
Author :
Protic, D. ; Riepe, G.
Author_Institution :
Institut fÿr Kernphysik der Kernforschungsanlage Jÿlich, D-5170 Jÿlich, Germany
Volume :
32
Issue :
1
fYear :
1985
Firstpage :
553
Lastpage :
555
Abstract :
A technique has been developed for fabricating digital position-sensitive detectors. The ion-implanted p+-contacts of high-purity germanium diodes were divided into several elements by etching (SF6-plasma) small grooves (50 ¿m wide and 10 ¿m deep) to obtain the desired structures. As the etch mask served an evaporated layer of aluminum, which had received the required pattern either by using a wire mask during the deposition or by a photolithographic process. Various detector types produced according to this technique are described.
Keywords :
Aluminum; Diodes; Fabrication; Germanium; Plasma applications; Position sensitive particle detectors; Silicon; Sulfur hexafluoride; Wet etching; Wire;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1985.4336893
Filename :
4336893
Link To Document :
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