Properties of Sr Ferrite Thin Films on Al-Si Underlayer

Author

Kaewrawang, Arkom ; Ghasemi, Ali ; Liu, Xiaoxi ; Morisako, Akimitsu

Author_Institution

Spin Device Technol. Center, Shinshu Univ., Nagano

Volume

45

Issue

6

fYear

2009

fDate

6/1/2009 12:00:00 AM

Firstpage

2587

Lastpage

2589

Abstract

Strontium ferrite thin films have been deposited on silicon wafer with Al-Si underlayer by using a magnetron sputtering system. The obvious peak for strontium ferrite films deposited on Al-Si underlayer can be observed when substrate temperature is higher than 550degC. The saturation magnetization, coercivity, and remanent squareness ratio of strontium ferrite thin films increase with increasing substrate temperature. The maximum of coercivity and remanent squareness ratio in perpendicular direction are 6.4 kOe and 0.72, respectively, at substrate temperature of 600degC.

Keywords

aluminium; coercive force; ferrites; magnetic thin films; silicon; sputter deposition; strontium compounds; surface morphology; Al-Si underlayer; Si; SrOFe₂O₃-Al-Si; coercivity; magnetron sputtering system; remanent squareness ratio; saturation magnetization; silicon wafer; strontium ferrite thin films; surface morphology; temperature 600 C; Al-Si; magnetron sputtering; perpendicular magnetic recording; strontium ferrite;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/TMAG.2009.2018900

Filename

4957797