DocumentCode :
908382
Title :
Recent datareviews from EMIS. Diffusion coefficient of oxygen in silicon, temperature dependence
Volume :
132
Issue :
4
fYear :
1985
fDate :
8/1/1985 12:00:00 AM
Firstpage :
196
Lastpage :
197
Keywords :
diffusion in solids; elemental semiconductors; silicon; O diffusion; O diffusivity; Si; absolute temperature; diffusion coefficient; semiconductor; temperature dependence;
fLanguage :
English
Journal_Title :
Solid-State and Electron Devices, IEE Proceedings I
Publisher :
iet
ISSN :
0143-7100
Type :
jour
DOI :
10.1049/ip-i-1.1985.0044
Filename :
4643956
Link To Document :
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