DocumentCode :
909008
Title :
On the potential function method and the increment error correction rule in pattern classification
Author :
Babu, C.C. ; Wah-Chun Chan
Volume :
57
Issue :
11
fYear :
1969
Firstpage :
2086
Lastpage :
2088
Abstract :
Based on the basic property that the solution weight vector of the linear pattern classifier can be expressed as a linear function of the training patterns, it is shown that the increment error correction algorithm is a special case of the potential function method. For linearly separable training patterns, a form of potential function which appears to be useful is also proposed.
Keywords :
Cutoff frequency; Epitaxial layers; Error correction; Geometry; Pattern classification; Scattering parameters; Sputter etching; Substrates; Testing; Transconductance;
fLanguage :
English
Journal_Title :
Proceedings of the IEEE
Publisher :
ieee
ISSN :
0018-9219
Type :
jour
DOI :
10.1109/PROC.1969.7482
Filename :
1449412
Link To Document :
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