Title :
On the potential function method and the increment error correction rule in pattern classification
Author :
Babu, C.C. ; Wah-Chun Chan
Abstract :
Based on the basic property that the solution weight vector of the linear pattern classifier can be expressed as a linear function of the training patterns, it is shown that the increment error correction algorithm is a special case of the potential function method. For linearly separable training patterns, a form of potential function which appears to be useful is also proposed.
Keywords :
Cutoff frequency; Epitaxial layers; Error correction; Geometry; Pattern classification; Scattering parameters; Sputter etching; Substrates; Testing; Transconductance;
Journal_Title :
Proceedings of the IEEE
DOI :
10.1109/PROC.1969.7482