Effects of Atmospheric DBCD Plasma on Three Kinds of Typical Microorganisms

Author

Zheng-Shi Chang ; Xing-Min Shi ; Guan-Jun Zhang ; Zhuo-Yuan Dong ; Xian-Jun Shao

Author_Institution

State Key Lab. of Electr. Insulation & Power Equip., Xi´an Jiaotong Univ., Xi´an, China

Volume

41

Issue

7

fYear

2013

fDate

Jul-13

Firstpage

1703

Lastpage

1708

Abstract

Dielectric barrier corona discharge (DBCD) is a robust plasma reactor with high efficiency and large scalable area. Nonthermal plasma is generated by DBCD in open condition under atmospheric pressure. Products of plasma are analyzed by using spectroscopy technology. The DBCD plasma is used to treat three kinds of typical microorganisms such as Escherichia coli, Staphylococcus aureus, and Candida albicans. Then, the inactivation effects of the plasma are discussed and compared with our formerly published results of parallel-plate dielectric barrier discharge (DBD) plasma. The results show that the DBCD plasma damages microbe cells by reactive species (RS) and lower pH values, while the parallel-plate DBD plasma works mainly through microdischarge channel and RS. In addition, different cell wall configurations result in different treatment effects.

Keywords

biological effects of ionising radiation; cellular effects of radiation; corona; microorganisms; pH; plasma applications; plasma diagnostics; Candida albicans; Escherichia coli; Staphylococcus aureus; atmospheric DBCD plasma; cell wall configurations; dielectric barrier corona discharge; low-pH values; microbe cells; microdischarge channel; microorganisms; nonthermal plasma; parallel-plate DBD plasma; parallel-plate dielectric barrier discharge plasma; plasma inactivation effect; plasma reactor; pressure 1 atm; reactive species; spectroscopy technology; Dielectrics; Discharges (electric); Electrodes; Microorganisms; Plasmas; Surface treatment; Suspensions; Air plasmas; dielectric barrier corona discharge (DBCD); inactivation effects; microdischarge channel; pH; reactive species (RS);

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/TPS.2013.2262954

Filename

6547212