• DocumentCode
    911915
  • Title

    Statistical Simulation of the IC Manufacturing Process

  • Author

    Maly, Wojciech ; Strojwas, Andrzej J.

  • Author_Institution
    Department of Electrical Engineering, Carnegie-Mellon University, Pittsburgh, PA, USA
  • Volume
    1
  • Issue
    3
  • fYear
    1982
  • fDate
    7/1/1982 12:00:00 AM
  • Firstpage
    120
  • Lastpage
    131
  • Abstract
    Information about the random behavior of the IC manufacturing process can be applied for IC and process design tasks. In this paper a methodology for modeling random fluctuations of IC manufacturing process is proposed. A simulator of a complete bipolar manufacturing process called FABRICS, is described. A few applications illustrating advantages of the proposed statistical process modeling method are discussed.
  • Keywords
    Circuit simulation; Computational modeling; Fabrics; Fluctuations; Impurities; Integrated circuit modeling; Manufacturing processes; Monolithic integrated circuits; Process design; Random variables;
  • fLanguage
    English
  • Journal_Title
    Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0278-0070
  • Type

    jour

  • DOI
    10.1109/TCAD.1982.1270003
  • Filename
    1270003