DocumentCode :
912119
Title :
Effects of the doping profile on current characteristics in BSITs
Author :
Kim, Chang-Woo ; Kimura, Masakazu ; Yano, Koji ; Tanaka, Akira ; Sukegawa, Tokuzo
Author_Institution :
Sch. of Electron. Sci. & Technol., Shizuoka Univ., Hamamatsu, Japan
Volume :
13
Issue :
2
fYear :
1992
Firstpage :
95
Lastpage :
97
Abstract :
Proposed are two doping profiles of the conducting channel in bipolar-mode static induction transistors (BSITs) that improve the current handling capability. By using the results obtained from two-dimensional device simulations, it is shown that BSITs with the proposed profiles exhibit higher drain current density and DC current gain than conventional BSITs. Also discussed is the tradeoff between the current and voltage capabilities.<>
Keywords :
doping profiles; field effect transistors; power transistors; semiconductor device models; DC current gain; SIT; bipolar-mode; conducting channel; current capability; current characteristics; current handling capability; doping profile; drain current density; static induction transistors; two-dimensional device simulations; voltage capabilities; Conducting materials; Current density; Doping profiles; Geometry; Impurities; Solid modeling; Voltage;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.144970
Filename :
144970
Link To Document :
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