DocumentCode :
912150
Title :
On the current density dependence of electromigration in thin films
Author :
Hofman, G.L. ; Breitling, H.M.
Volume :
58
Issue :
5
fYear :
1970
fDate :
5/1/1970 12:00:00 AM
Firstpage :
833
Lastpage :
833
Abstract :
Comments are made on a recently publicized theory on electromigration in thin films. It is shown that the rate of electromigration is a linear function of the current density and not a quadratic function as proposed by Black.
Keywords :
Aluminum; Crystallization; Current density; Electromigration; Electrons; History; Oscillators; Solids; Spectral analysis; Transistors;
fLanguage :
English
Journal_Title :
Proceedings of the IEEE
Publisher :
ieee
ISSN :
0018-9219
Type :
jour
DOI :
10.1109/PROC.1970.7772
Filename :
1449702
Link To Document :
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