• DocumentCode
    912430
  • Title

    A Reevaluation of Worst-Case Postirradiation Response for Hardened MOS Transistors

  • Author

    Fleetwood, D.M. ; Dressendorfer, P.V. ; Turpin, D.C.

  • Author_Institution
    Sandia National Laboratories P.0. Box 5800 Albuquerque, New Mexico 87185
  • Volume
    34
  • Issue
    6
  • fYear
    1987
  • Firstpage
    1178
  • Lastpage
    1183
  • Abstract
    The "worst-case" postirradiation response of Sandia hardened n-channel transistors following Co-60 exposure to total dose levels of system interest is demonstrated to occur for zero-volt bias during radiation, and positive bias during a subsequent anneal. This observation is explained in terms of oxide-trapped and interface-state charge buildup and anneal. Additional results are presented which suggest that, for future technologies with very thin gate oxides, worst-case device leakage during irradiation may well occur for zero-volt irradiations. These results highlight the importance of periodically reevaluating the response of MOS devices during and after irradiation to determine worst-case test conditions, particularly as technologies advance and gate insulators become thinner.
  • Keywords
    Annealing; CMOS technology; Circuits; Degradation; Laboratories; Leakage current; MOS devices; MOSFETs; Space technology; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1987.4337449
  • Filename
    4337449