FABRICS II: A Statistically Based IC Fabrication Process Simulator

Author

Nassif, Sani R. ; Strojwas, Andrzej J. ; Director, Stephen W.

Author_Institution

Department of Electrical and Computer Engineering, Carnegie-Mellon University, Pittsburgh, PA, USA

Volume

3

Issue

1

fYear

1984

fDate

1/1/1984 12:00:00 AM

Firstpage

40

Lastpage

46

Abstract

This paper describes FABRICS II, an IC fabriction process simulator which takes into account the statistical fluctuations inherent in the manufacturing process. FABRICS II is composed of two parts, a fabrication process simulator FAB1, and a semiconductor device simulator FAB2. The simulator produces model parameters of typical semiconductor devices manufactured in various fabrication processes (NMOS, CMOS, or bipolar). Possible applications of FABRICS II include verification and optimization of process and circuit design, yield prediction and maximization prior to IC fabrication, and IC failure analysis. Two examples which illustrate the application of FABRICS II are presented.

Keywords

Application specific integrated circuits; Circuit simulation; Fabrication; Fabrics; Fluctuations; Integrated circuit modeling; Manufacturing processes; Semiconductor device modeling; Semiconductor devices; Virtual manufacturing;

fLanguage

English

Journal_Title

Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on

Publisher

ieee

ISSN

0278-0070

Type

jour

DOI

10.1109/TCAD.1984.1270055

Filename

1270055