DocumentCode :
912451
Title :
FABRICS II: A Statistically Based IC Fabrication Process Simulator
Author :
Nassif, Sani R. ; Strojwas, Andrzej J. ; Director, Stephen W.
Author_Institution :
Department of Electrical and Computer Engineering, Carnegie-Mellon University, Pittsburgh, PA, USA
Volume :
3
Issue :
1
fYear :
1984
fDate :
1/1/1984 12:00:00 AM
Firstpage :
40
Lastpage :
46
Abstract :
This paper describes FABRICS II, an IC fabriction process simulator which takes into account the statistical fluctuations inherent in the manufacturing process. FABRICS II is composed of two parts, a fabrication process simulator FAB1, and a semiconductor device simulator FAB2. The simulator produces model parameters of typical semiconductor devices manufactured in various fabrication processes (NMOS, CMOS, or bipolar). Possible applications of FABRICS II include verification and optimization of process and circuit design, yield prediction and maximization prior to IC fabrication, and IC failure analysis. Two examples which illustrate the application of FABRICS II are presented.
Keywords :
Application specific integrated circuits; Circuit simulation; Fabrication; Fabrics; Fluctuations; Integrated circuit modeling; Manufacturing processes; Semiconductor device modeling; Semiconductor devices; Virtual manufacturing;
fLanguage :
English
Journal_Title :
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
Publisher :
ieee
ISSN :
0278-0070
Type :
jour
DOI :
10.1109/TCAD.1984.1270055
Filename :
1270055
Link To Document :
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