DocumentCode :
912551
Title :
Heterostructure semiconductor Raman laser
Author :
Suto, K. ; Kimura, T. ; Nishizawa, J.
Author_Institution :
Tohoku University, Research Institute of Electrical Communication, Sendai, Japan
Volume :
134
Issue :
4
fYear :
1987
fDate :
8/1/1987 12:00:00 AM
Firstpage :
215
Lastpage :
220
Abstract :
This paper describes the first lasing experiment of the heterostructure semiconductor Raman laser with a GaP Raman active layer as thin as 15 ¿¿m and AlxGa1¿¿xP cladding layers for optical confinement, which should be a step towards realising a semiconductor Raman laser pumped by a semiconductor injection laser applicable to wideband optical communication. Also, the four-layer structure Raman laser is reported, by which the strain-induced optical anisotropy caused by the lattice mismatching can be reduced.
Keywords :
III-V semiconductors; Raman lasers; aluminium compounds; gallium compounds; semiconductor junction lasers; 15 micron; AlxGa1-xP cladding layers; GaP Raman active layer; GaP-AlxGa1-xP; four-layer structure Raman laser; heterostructure semiconductor Raman laser; lattice mismatching; optical confinement; semiconductor injection laser; semiconductors; strain-induced optical anisotropy; wideband optical communication;
fLanguage :
English
Journal_Title :
Optoelectronics, IEE Proceedings J
Publisher :
iet
ISSN :
0267-3932
Type :
jour
DOI :
10.1049/ip-j.1987.0038
Filename :
4644396
Link To Document :
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