DocumentCode
9127
Title
High-Performance Current Saturating Graphene Field-Effect Transistor With Hexagonal Boron Nitride Dielectric on Flexible Polymeric Substrates
Author
Jongho Lee ; Tae-Jun Ha ; Parrish, Kristen N. ; Chowdhury, S.F. ; Li Tao ; Dodabalapur, Ananth ; Akinwande, Deji
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of Texas at Austin, Austin, TX, USA
Volume
34
Issue
2
fYear
2013
fDate
Feb. 2013
Firstpage
172
Lastpage
174
Abstract
Graphene transistors using hexagonal boron nitride as the gate dielectric are implemented on mechanically flexible polyimide films. Current saturation is observed for the first time in graphene transistors on a plastic substrate. An atomically smooth insulating surface is achieved with the proposed capture-release process and two-step annealing process, resulting in subnanometer surface roughness. The device shows strong electrical performance: Extracted mobility exceeds 2300 cm2/V·s for both electron and hole transport, and drive current is over 300 μS/μm. This transport symmetry affords frequency doublers with high spectral purity and a conversion gain of - 29.5 dB and output power of -22.2 dBm, representing the highest performance for graphene transistors on flexible substrates.
Keywords
III-V semiconductors; MOSFET; annealing; boron compounds; chemical vapour deposition; dielectric devices; electron mobility; flexible electronics; frequency multipliers; graphene; hole mobility; plastics; substrates; surface roughness; wide band gap semiconductors; C-BN; atomically smooth insulating surface; capture-release process; conversion gain; drive current; electrical performance; electron transport; flexible polymeric substrates; frequency doublers; gain -29.5 dB; hexagonal gate dielectric; high spectral purity; high-performance current saturating graphene field-effect transistor; hole transport; mechanically flexible polyimide films; mobility extraction; plastic substrate; subnanometer surface roughness; transport symmetry; two-step annealing process; Dielectrics; Graphene; Logic gates; Rough surfaces; Substrates; Surface treatment; Transistors; Chemical vapor deposition (CVD) graphene; RF and analog device; flexible nanoelectronics; hexagonal boron nitride (h-BN);
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2012.2233707
Filename
6410337
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