DocumentCode :
912993
Title :
Radiation hard 1.0μm CMOS technology
Author :
Lee, K.H. ; Desko, John C. ; Kohler, Ross A. ; Lawrence, Cris W. ; Nagy, William J. ; Shimer, Julie A. ; Steenwyk, Steven D. ; Anderson, Richard E. ; Fu, Julia S.
Volume :
34
Issue :
6
fYear :
1987
Firstpage :
1460
Lastpage :
1463
Abstract :
This paper describes radiation test results of a radiation hard CMOS technology with 1.0 μm minimum geometry features. The radiation goals of this technology are to ensure the MOS devices are functional after 10 Mrad total dose irradiation, are single event upset hardened to less than 1E-10 errors per bit-day, are transient upset immune to 1E9 rads/sec and are latch-up free.
Keywords :
CMOS technology; Current measurement; Degradation; Electrodes; Interface states; Leakage current; Testing; Threshold voltage; Transconductance; Voltage control;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1987.4337498
Filename :
4337498
Link To Document :
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