DocumentCode
912993
Title
Radiation hard 1.0μm CMOS technology
Author
Lee, K.H. ; Desko, John C. ; Kohler, Ross A. ; Lawrence, Cris W. ; Nagy, William J. ; Shimer, Julie A. ; Steenwyk, Steven D. ; Anderson, Richard E. ; Fu, Julia S.
Volume
34
Issue
6
fYear
1987
Firstpage
1460
Lastpage
1463
Abstract
This paper describes radiation test results of a radiation hard CMOS technology with 1.0 μm minimum geometry features. The radiation goals of this technology are to ensure the MOS devices are functional after 10 Mrad total dose irradiation, are single event upset hardened to less than 1E-10 errors per bit-day, are transient upset immune to 1E9 rads/sec and are latch-up free.
Keywords
CMOS technology; Current measurement; Degradation; Electrodes; Interface states; Leakage current; Testing; Threshold voltage; Transconductance; Voltage control;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1987.4337498
Filename
4337498
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