DocumentCode :
913042
Title :
CAD for VLSI: Symple: a symbolic layout tool for bipolar and MOS VLSI
Author :
Szabó, K. S B ; Leask, J.M. ; Elmasry, M.I.
Author_Institution :
Bell Northern Research Ltd., Ottawa, Canada
Volume :
135
Issue :
2
fYear :
1988
fDate :
4/1/1988 12:00:00 AM
Firstpage :
29
Lastpage :
38
Abstract :
Symbolic layout offers a powerful and flexible methodology for the design of bipolar and MOS cells. An integrated set of symbols that addresses both bipolar and MOS devices was previously reported. A design tool that implements the symbolic methodology based on that set has been developed; Symple is a processindependent layout editor that allows the designer to symbolically create cells in bipolar, NMOS, CMOS, mixed BIMOS, or a mixed BICMOS technology. While the program abstracts most of the process complexities from the designer, it also retains the relevant layout features. Mechanisms for compaction, mask generation and circuit extraction are included.
Keywords :
VLSI; bipolar integrated circuits; circuit layout CAD; field effect integrated circuits; CMOs; NMOS ICs; Symple; bipolar ICs; circuit extraction; circuit layout CAD; compaction; integrated set of symbols; mask generation; mixed BICMOS; mixed BIMOS; process-independent layout editor; relevant layout features; symbolic layout tool; symbolic methodology; symbolically create cells;
fLanguage :
English
Journal_Title :
Solid-State and Electron Devices, IEE Proceedings I
Publisher :
iet
ISSN :
0143-7100
Type :
jour
DOI :
10.1049/ip-i-1.1988.0007
Filename :
4644447
Link To Document :
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