DocumentCode :
913367
Title :
COMPOSITE -- A Complete Modeling Program of Silicon Technology
Author :
Lorenz, Jurgen ; Pelka, Joachim ; Ryssel, Heiner ; Sachs, Albert ; Seidl, Albert ; Svoboda, Milos
Author_Institution :
Fraunhofer-Arbeitgsgruppe fur Integrierte Schaltungen (AIS), Erlangen, Germany
Volume :
4
Issue :
4
fYear :
1985
fDate :
10/1/1985 12:00:00 AM
Firstpage :
421
Lastpage :
430
Abstract :
A new two-dimensional process modeling program written in Fortran is described. For the first time, this program allows the simulation of all important processing steps occurring in typical sequences involved in the fabrication of integrated circuits such as doping, oxidation, lithography, etching, and layer deposition. The program possesses a modular structure to allow for easy changing and improvement of process models as well as of mathematical procedures. The program is menu driven to make it easy to use for non-experts and it is readily usable with different computer systems.
Keywords :
Circuit simulation; Doping; Etching; Fabrication; Integrated circuit technology; Lithography; Mathematical model; Oxidation; Semiconductor process modeling; Silicon;
fLanguage :
English
Journal_Title :
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
Publisher :
ieee
ISSN :
0278-0070
Type :
jour
DOI :
10.1109/TCAD.1985.1270140
Filename :
1270140
Link To Document :
بازگشت