Title :
COMPOSITE -- A Complete Modeling Program of Silicon Technology
Author :
Lorenz, Jurgen ; Pelka, Joachim ; Ryssel, Heiner ; Sachs, Albert ; Seidl, Albert ; Svoboda, Milos
Author_Institution :
Fraunhofer-Arbeitgsgruppe fur Integrierte Schaltungen (AIS), Erlangen, Germany
fDate :
10/1/1985 12:00:00 AM
Abstract :
A new two-dimensional process modeling program written in Fortran is described. For the first time, this program allows the simulation of all important processing steps occurring in typical sequences involved in the fabrication of integrated circuits such as doping, oxidation, lithography, etching, and layer deposition. The program possesses a modular structure to allow for easy changing and improvement of process models as well as of mathematical procedures. The program is menu driven to make it easy to use for non-experts and it is readily usable with different computer systems.
Keywords :
Circuit simulation; Doping; Etching; Fabrication; Integrated circuit technology; Lithography; Mathematical model; Oxidation; Semiconductor process modeling; Silicon;
Journal_Title :
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
DOI :
10.1109/TCAD.1985.1270140