DocumentCode :
913429
Title :
Transient Radiation Effects in SOI Static RAM Cells
Author :
Mikawa, R.E. ; Ackermann, M.R.
Author_Institution :
Sandia National Laboratories Albuquerque, New Mexico 87185
Volume :
34
Issue :
6
fYear :
1987
Firstpage :
1698
Lastpage :
1703
Abstract :
Recent transient radiation experiments have shown a substrate bias dependence on the logic upset levels of a silicon-on-insulator (SOI) technology. From this data, it was concluded that secondary photocurrents generated by the parasitic bipolar junction transistors (BJTs) were responsible for the observed difference in the bias dependent transient radiation induced upset thresholds. In this report we present our results obtained from computer simulations of the transient radiation response of the SOI technology. These results support a possible explanation for the bias dependent logic upset levels experimentally observed. Parasitic BJT gain calculations, gain modulation and substrate bias effects on transient upset thresholds in static random access memory (SRAM) cells are discussed.
Keywords :
Body regions; CMOS technology; Charge carrier density; Doping; Isolation technology; Logic; Photoconductivity; Radiation effects; Read-write memory; Substrates;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1987.4337539
Filename :
4337539
Link To Document :
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