DocumentCode :
913618
Title :
An Empirical Model for the Threshold Voltage of Enhancement NMOSFET´s
Author :
Park, Hong-June ; Kim, Choong-Ki
Author_Institution :
Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA, USA
Volume :
4
Issue :
4
fYear :
1985
fDate :
10/1/1985 12:00:00 AM
Firstpage :
629
Lastpage :
635
Abstract :
A new empirical model for the threshold voltage of enhancement NMOSFET is proposed based on experimental observations. This model covers both short and narrow channel effects. The model equation is formulated by the superposition of these two effects, and extraction of model parameters is presented. Comparison of the model with experimentally measured values shows good agreement for transistors with effective channel length down to 1.8 μm and effective channel width down to 1.0 μm.
Keywords :
Channel bank filters; Circuit simulation; Doping; Electrodes; Equations; Length measurement; MOSFET circuits; SPICE; Substrates; Threshold voltage;
fLanguage :
English
Journal_Title :
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
Publisher :
ieee
ISSN :
0278-0070
Type :
jour
DOI :
10.1109/TCAD.1985.1270163
Filename :
1270163
Link To Document :
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