DocumentCode :
913647
Title :
Temperature and Epi Thickness Dependence of the Heavy Ion Induced Latchup Threshold for a CMOS/EPI 16K Static RAM
Author :
Smith, L.S. ; Nichols, D.K. ; Coss, J.R. ; Price, W.E. ; Binder, D.
Author_Institution :
Jet Propulsion Laboratory California Institute of Technology 4800 Oak Grove Drive Pasadena, California 91109
Volume :
34
Issue :
6
fYear :
1987
Firstpage :
1800
Lastpage :
1802
Abstract :
Data have been obtained with krypton and xenon ions for the latchup threshold vs. temperature of four different versions of a Harris CMOS/epi 16K static RAM. These special versions of the HM6516 RAM have 12-micron, 9-micron, 7-micron and 5-micron epi thicknesses, as grown. The test data showed a marked improvement in latchup resistance with decreasing epi thickness and with decreasing temperature over the range of 25°C (operating chip ambient) to 100°C.
Keywords :
Cyclotrons; Infrared heating; Pollution measurement; Temperature control; Temperature dependence; Temperature distribution; Temperature measurement; Temperature sensors; Testing; Xenon;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1987.4337558
Filename :
4337558
Link To Document :
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