• DocumentCode
    914179
  • Title

    SLS: An Advanced Symbolic Layout System for Bipolar and FET Design

  • Author

    Posluszny, Stephen D.

  • Author_Institution
    IBM, East Fishkill, NY, USA
  • Volume
    5
  • Issue
    4
  • fYear
    1986
  • fDate
    10/1/1986 12:00:00 AM
  • Firstpage
    450
  • Lastpage
    458
  • Abstract
    This paper describes features of the Symbolic Layout System (SLS), an advanced layout system for VLSI designs. Symbolic layout is a method by which point objects, wires, and regions are sketched on a virtual grid, converted to shapes, and then spaced according to a set of minimum ground rules using a compactor. Point objects are defined as terminals, FET transistors, contacts, or vias. These objects are connected using wires or "sticks." Flexible regions (orthogonal polygons) are provided for building wells, bipolar transistors, or complex devices. Network extraction is performed on the wires and point objects to check connectivity and provide net information to the compactor. The compaction process is interactively controlled, allowing the user to override design rules, insert jogs, build compaction fences, and specify the compaction center. SLS is technology independent, making it useful for bipolar and FET technologies.
  • Keywords
    Bipolar transistors; Buildings; Compaction; Data mining; FETs; Laser sintering; Process control; Shape; Very large scale integration; Wires;
  • fLanguage
    English
  • Journal_Title
    Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0278-0070
  • Type

    jour

  • DOI
    10.1109/TCAD.1986.1270216
  • Filename
    1270216