DocumentCode
914394
Title
Ion Implantation Calculations in Two Dimensions Using the Boltzmann Transport Equation
Author
Giles, Martin D.
Author_Institution
AT&T Bell Laboratories, Murray Hill, NJ, USA
Volume
5
Issue
4
fYear
1986
fDate
10/1/1986 12:00:00 AM
Firstpage
679
Lastpage
684
Abstract
A two-dimensional method based on numerical solution of the Boltzmann transport equation has been developed for calculating ion implantation profiles. The method is capable of treating arbitrarily contoured surfaces containing multiple layers of different materials. Calculations yield the concentration profile of the implanted ion, an estimate of the damage distribution, and concentration profiles from recoiled target atoms. Substantial differences are seen from one-dimensional and point-response two-dimensional methods when the interfaces are far from planar.
Keywords
Atomic layer deposition; Boltzmann equation; Costs; Design automation; Helium; Ion implantation; Scattering; Shape; Surface treatment; Yield estimation;
fLanguage
English
Journal_Title
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
Publisher
ieee
ISSN
0278-0070
Type
jour
DOI
10.1109/TCAD.1986.1270237
Filename
1270237
Link To Document