• DocumentCode
    914394
  • Title

    Ion Implantation Calculations in Two Dimensions Using the Boltzmann Transport Equation

  • Author

    Giles, Martin D.

  • Author_Institution
    AT&T Bell Laboratories, Murray Hill, NJ, USA
  • Volume
    5
  • Issue
    4
  • fYear
    1986
  • fDate
    10/1/1986 12:00:00 AM
  • Firstpage
    679
  • Lastpage
    684
  • Abstract
    A two-dimensional method based on numerical solution of the Boltzmann transport equation has been developed for calculating ion implantation profiles. The method is capable of treating arbitrarily contoured surfaces containing multiple layers of different materials. Calculations yield the concentration profile of the implanted ion, an estimate of the damage distribution, and concentration profiles from recoiled target atoms. Substantial differences are seen from one-dimensional and point-response two-dimensional methods when the interfaces are far from planar.
  • Keywords
    Atomic layer deposition; Boltzmann equation; Costs; Design automation; Helium; Ion implantation; Scattering; Shape; Surface treatment; Yield estimation;
  • fLanguage
    English
  • Journal_Title
    Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0278-0070
  • Type

    jour

  • DOI
    10.1109/TCAD.1986.1270237
  • Filename
    1270237