DocumentCode :
914394
Title :
Ion Implantation Calculations in Two Dimensions Using the Boltzmann Transport Equation
Author :
Giles, Martin D.
Author_Institution :
AT&T Bell Laboratories, Murray Hill, NJ, USA
Volume :
5
Issue :
4
fYear :
1986
fDate :
10/1/1986 12:00:00 AM
Firstpage :
679
Lastpage :
684
Abstract :
A two-dimensional method based on numerical solution of the Boltzmann transport equation has been developed for calculating ion implantation profiles. The method is capable of treating arbitrarily contoured surfaces containing multiple layers of different materials. Calculations yield the concentration profile of the implanted ion, an estimate of the damage distribution, and concentration profiles from recoiled target atoms. Substantial differences are seen from one-dimensional and point-response two-dimensional methods when the interfaces are far from planar.
Keywords :
Atomic layer deposition; Boltzmann equation; Costs; Design automation; Helium; Ion implantation; Scattering; Shape; Surface treatment; Yield estimation;
fLanguage :
English
Journal_Title :
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
Publisher :
ieee
ISSN :
0278-0070
Type :
jour
DOI :
10.1109/TCAD.1986.1270237
Filename :
1270237
Link To Document :
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