• DocumentCode
    914629
  • Title

    Analysis of Velocity Saturation and Other Effects on Short-Channel MOS Transistor Capacitances

  • Author

    Iwai, Hiroshi ; Pinto, Mark R. ; Rafferty, Conor S. ; Oristian, John E. ; Dutton, Robert W.

  • Author_Institution
    Semiconductor Device Engineering Laboratory, Toshiba Research and Development Center, Kawasaki,Japan
  • Volume
    6
  • Issue
    2
  • fYear
    1987
  • fDate
    3/1/1987 12:00:00 AM
  • Firstpage
    173
  • Lastpage
    184
  • Abstract
    In order to analyze short-channel effects of MOS transistor ac characteristics, a two-dimensional device simulator has been used to extract MOS transistor capacitances. The results of simulation and measurements agree well. The causes of short-channel effects have been understood and explained by the simulations. Two-dimensional effects and velocity saturation are the main causes of short-channel effects in MOS transistor capacitances. Two-dimensional simulation was found to be a useful tool for studying mobility models, as well as for obtaining capacitance models for circuit simulation.
  • Keywords
    Analytical models; Associate members; Capacitance measurement; Circuit simulation; Laboratories; MOSFETs; Measurement techniques; Physics; Threshold voltage; Very large scale integration;
  • fLanguage
    English
  • Journal_Title
    Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0278-0070
  • Type

    jour

  • DOI
    10.1109/TCAD.1987.1270261
  • Filename
    1270261