Second-order optical nonlinearity in thermally poled phosphorus-doped silicon dioxide thin-film waveguides

A phosphorus-doped silicon dioxide nonlinear planar waveguide on a GE124 fused silica substrate using plasma-enhanced chemical vapour deposition and thermal poling technique is implemented. The stable second-order nonlinear susceptibility induced in the waveguide is estimated to be around 0.58 pm/V by means of hydrofluoric acid etching, Maker´s fringe measurement and grid search curve fitting using a double-step nonlinear profile. This nonlinear planar waveguide may be applied to fabricate an electrooptic device on the silicon photonic chip.