• DocumentCode
    916538
  • Title

    High-resolution pattern replication using soft X rays

  • Author

    Spears, D.L. ; Smith, Henry I.

  • Author_Institution
    Massachusetts Institute of Technology, Lincoln Laboratory, Lexington, USA
  • Volume
    8
  • Issue
    4
  • fYear
    1972
  • Firstpage
    102
  • Lastpage
    104
  • Abstract
    A soft X ray lithographic technique capable of contactless replication of submicrometre linewidth planar-device patterns is described. Special soft X ray exposure masks have been developed for the 4¿14 Å wavelength region. Elastic-surface-wave-transducer patterns with 1.3 ¿m electrode spacings were fabricated onto such masks using electron-beam techniques, and were successfully replicated.
  • Keywords
    X-ray applications; gamma-ray applications; integrated circuit production; X-ray lithographic technique; elastic surface wave transducer patterns; electron beam techniques; exposure masks; submicrometre linewidth;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19720074
  • Filename
    4235520
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=916538