• DocumentCode
    917176
  • Title

    Amplification mechanism of ion-ripple lasers and its possible applications

  • Author

    Chen, Kuan-Ren ; Dawson, John M.

  • Author_Institution
    Inst. for Fusion Studies, Texas Univ., Austin, TX, USA
  • Volume
    21
  • Issue
    1
  • fYear
    1993
  • fDate
    2/1/1993 12:00:00 AM
  • Firstpage
    151
  • Lastpage
    155
  • Abstract
    The ion-ripple laser (IRL) is an advanced scheme for generating coherent high-power radiation, in which a relativistic electron beam propagates obliquely through an ion ripple in a plasma. Its amplification mechanism is described by a low gain theory, while the linear growth rate is given by the dispersion relation. The efficiency of the lasing is determined by the nonlinear saturation mechanism discussed. By proper choice of device parameters, sources of microwaves, optical, and perhaps even X-rays can be made. The availability of tunable sources for wide wavelength regimes, coherence and high-power, as well as lower cost and simplicity of equipment, are emphasized
  • Keywords
    dispersion relations; ion lasers; laser theory; optical saturation; plasma-beam interactions; X-ray sources; amplification mechanism; coherent high-power radiation; device parameters; dispersion relation; ion-ripple laser; lasing efficiency; linear growth rate; low gain theory; microwaves sources; nonlinear saturation mechanism; optical sources; plasma; relativistic electron beam; tunable sources; Dispersion; Electron beams; Laser theory; Microwave devices; Nonlinear optical devices; Optical propagation; Particle beam optics; Plasma devices; Plasma sources; Plasma x-ray sources;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.221114
  • Filename
    221114