• DocumentCode
    917225
  • Title

    Effect of plasma sheath structure in plasma focus

  • Author

    Wang, Xin Xin ; Yang, Tsin Chi

  • Author_Institution
    Dept. of Electr. Eng., Tsinghua Univ., Beijing, China
  • Volume
    21
  • Issue
    1
  • fYear
    1993
  • fDate
    2/1/1993 12:00:00 AM
  • Firstpage
    175
  • Lastpage
    180
  • Abstract
    The development of plasma sheath in the run-down phase and pinch phase in a plasma focus is studied with laser interferometry. The time-resolved interferograms show that the structures of plasma sheaths in the run-down phase are different at low and high pressures of filling gas. This leads to a distinct plasma pattern above the anode. At low pressure the plasma sheath in the run-down phase has clear boundaries, resulting in better compression in the pinch phase and a higher X-ray yield. At high pressure the plasma sheath is turbulent at the back side and become disordered in the pinch phase, giving little or no X-ray emission. The effect of a ceiling, i.e., a metal plate placed above the anode, is investigated. With the ceiling the reproducibility of X-ray emission is much improved
  • Keywords
    high-speed optical techniques; light interferometry; pinch effect; plasma diagnostics by laser beam; plasma focus; plasma sheaths; plasma turbulence; X-ray emission; X-ray yield; anode; ceiling; disorder; filling gas; laser interferometry; metal plate; pinch phase; plasma focus; plasma pattern; plasma sheath structure; run-down phase; time-resolved interferograms; turbulence; Anodes; Electrodes; Filling; Ion beams; Neutrons; Plasma applications; Plasma devices; Plasma sheaths; Plasma x-ray sources; Reproducibility of results;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.221118
  • Filename
    221118