• DocumentCode
    917574
  • Title

    Anomalous behaviour of dielectric dispersion properties of evaporated silicon oxide films under DC high electric fields

  • Author

    Adachi, H. ; Shibata, Y.

  • Author_Institution
    Tohoku University, Department of Electronic Engineering, Faculty of Engineering, Sendai, Japan
  • Volume
    128
  • Issue
    3
  • fYear
    1981
  • fDate
    4/1/1981 12:00:00 AM
  • Firstpage
    202
  • Lastpage
    208
  • Abstract
    It is observed that AC dispersion properties of evaporated silicon oxide film are largely affected by a DC biasing voltage. This anomalous effect is explained in connection with the previously reported experimental results of electrically excited thermally stimulated current (ETSC). Numerical calculation of this effect is based on a two-site hopping model and taking into consideration the internal field gives a hopping distance in a two-site pair of about 5.7 ¿¿, which is very close to the lattice constant of quartz. It is concluded that the two-site hopping pair probably originates from ionic jumps between nearest vacancies. As far as the experimental results are concerned, there are no contraditions in the interpretations of the DC and AC conductances in terms of independent mechanisms.
  • Keywords
    dielectric relaxation; dielectric thin films; metal-insulator-metal structures; silicon compounds; thermally stimulated currents; Al-SiOx-Al; DC high electric fields; anomalous effect; dielectric dispersion properties; electrically excited thermally stimulated current; evaporated SiOx films; two-site hopping model;
  • fLanguage
    English
  • Journal_Title
    Physical Science, Measurement and Instrumentation, Management and Education - Reviews, IEE Proceedings A
  • Publisher
    iet
  • ISSN
    0143-702X
  • Type

    jour

  • DOI
    10.1049/ip-a-1.1981.0031
  • Filename
    4644961