DocumentCode
918487
Title
Some Recent Topics of Non-equilibrium Discharge Plasma Technologies - Their Widespread Use from Low Pressure to Atmospheric Pressure
Author
Nakano, Toshiki
Author_Institution
Nat. Defense Acad., Yokosuka
Volume
14
Issue
5
fYear
2007
fDate
10/1/2007 12:00:00 AM
Firstpage
1081
Lastpage
1087
Abstract
Non-equilibrium discharge plasmas have been utilized in a variety of fields and are indispensable to material processing, nanotechnologies and biotechnologies besides conventional applications such as light sources. In this review, neutral beam etching, advanced oxidation, protein removal, combustion control and volume, non-equilibrium discharge generation at atmospheric pressure are chosen and summarized as the recent, typical applications of the non-equilibrium discharge plasmas generated from low pressure to atmospheric pressure. A brief introduction of non-equilibrium discharge plasmas is also given, which serves comprehensive understanding of the physics and chemistry behind the technology.
Keywords
combustion; etching; glow discharges; plasma materials processing; atmospheric pressure; biotechnologies; combustion control; discharge plasma technologies; light sources; nanotechnologies; neutral beam etching; oxidation; plasma materials-processing; pressure glow discharge; protein removal; sterilization; Atmospheric-pressure plasmas; Biotechnology; Fault location; Light sources; Nanostructured materials; Particle beams; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma sources;
fLanguage
English
Journal_Title
Dielectrics and Electrical Insulation, IEEE Transactions on
Publisher
ieee
ISSN
1070-9878
Type
jour
DOI
10.1109/TDEI.2007.4339467
Filename
4339467
Link To Document