• DocumentCode
    918487
  • Title

    Some Recent Topics of Non-equilibrium Discharge Plasma Technologies - Their Widespread Use from Low Pressure to Atmospheric Pressure

  • Author

    Nakano, Toshiki

  • Author_Institution
    Nat. Defense Acad., Yokosuka
  • Volume
    14
  • Issue
    5
  • fYear
    2007
  • fDate
    10/1/2007 12:00:00 AM
  • Firstpage
    1081
  • Lastpage
    1087
  • Abstract
    Non-equilibrium discharge plasmas have been utilized in a variety of fields and are indispensable to material processing, nanotechnologies and biotechnologies besides conventional applications such as light sources. In this review, neutral beam etching, advanced oxidation, protein removal, combustion control and volume, non-equilibrium discharge generation at atmospheric pressure are chosen and summarized as the recent, typical applications of the non-equilibrium discharge plasmas generated from low pressure to atmospheric pressure. A brief introduction of non-equilibrium discharge plasmas is also given, which serves comprehensive understanding of the physics and chemistry behind the technology.
  • Keywords
    combustion; etching; glow discharges; plasma materials processing; atmospheric pressure; biotechnologies; combustion control; discharge plasma technologies; light sources; nanotechnologies; neutral beam etching; oxidation; plasma materials-processing; pressure glow discharge; protein removal; sterilization; Atmospheric-pressure plasmas; Biotechnology; Fault location; Light sources; Nanostructured materials; Particle beams; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma sources;
  • fLanguage
    English
  • Journal_Title
    Dielectrics and Electrical Insulation, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1070-9878
  • Type

    jour

  • DOI
    10.1109/TDEI.2007.4339467
  • Filename
    4339467