DocumentCode :
918786
Title :
RESET Mechanism of TiOx Resistance-Change Memory Device
Author :
Wang, Wei ; Fujita, Shinobu ; Wong, S. Simon
Author_Institution :
Dept. of Electr. Eng., Stanford Univ., Stanford, CA
Volume :
30
Issue :
7
fYear :
2009
fDate :
7/1/2009 12:00:00 AM
Firstpage :
733
Lastpage :
735
Abstract :
In this letter, the physical mechanisms of resetting a TiOx resistance-change memory device are explored for both unipolar and bipolar switching modes. It is observed that the statistical distributions of switching parameters are very different for the two types of switching modes. The data support previous evidence that thermal dissolution of the conductive filament (CF) is the mechanism for unipolar reset, while local redox reaction is responsible for bipolar reset. It is found that the CF is destroyed during unipolar switching but can be reused during bipolar switching.
Keywords :
statistical distributions; storage management chips; switching circuits; thin films; titanium compounds; TiOx; bipolar switching modes; conductive filament; local redox reaction; resistance-change memory device; statistical distributions; unipolar switching mode; Bipolar switching; reset; resistance-change memory; titanium oxide (TiOx); unipolar switching;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2009.2021001
Filename :
4982706
Link To Document :
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