• DocumentCode
    918786
  • Title

    RESET Mechanism of TiOx Resistance-Change Memory Device

  • Author

    Wang, Wei ; Fujita, Shinobu ; Wong, S. Simon

  • Author_Institution
    Dept. of Electr. Eng., Stanford Univ., Stanford, CA
  • Volume
    30
  • Issue
    7
  • fYear
    2009
  • fDate
    7/1/2009 12:00:00 AM
  • Firstpage
    733
  • Lastpage
    735
  • Abstract
    In this letter, the physical mechanisms of resetting a TiOx resistance-change memory device are explored for both unipolar and bipolar switching modes. It is observed that the statistical distributions of switching parameters are very different for the two types of switching modes. The data support previous evidence that thermal dissolution of the conductive filament (CF) is the mechanism for unipolar reset, while local redox reaction is responsible for bipolar reset. It is found that the CF is destroyed during unipolar switching but can be reused during bipolar switching.
  • Keywords
    statistical distributions; storage management chips; switching circuits; thin films; titanium compounds; TiOx; bipolar switching modes; conductive filament; local redox reaction; resistance-change memory device; statistical distributions; unipolar switching mode; Bipolar switching; reset; resistance-change memory; titanium oxide (TiOx); unipolar switching;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2009.2021001
  • Filename
    4982706