DocumentCode
918786
Title
RESET Mechanism of TiOx Resistance-Change Memory Device
Author
Wang, Wei ; Fujita, Shinobu ; Wong, S. Simon
Author_Institution
Dept. of Electr. Eng., Stanford Univ., Stanford, CA
Volume
30
Issue
7
fYear
2009
fDate
7/1/2009 12:00:00 AM
Firstpage
733
Lastpage
735
Abstract
In this letter, the physical mechanisms of resetting a TiOx resistance-change memory device are explored for both unipolar and bipolar switching modes. It is observed that the statistical distributions of switching parameters are very different for the two types of switching modes. The data support previous evidence that thermal dissolution of the conductive filament (CF) is the mechanism for unipolar reset, while local redox reaction is responsible for bipolar reset. It is found that the CF is destroyed during unipolar switching but can be reused during bipolar switching.
Keywords
statistical distributions; storage management chips; switching circuits; thin films; titanium compounds; TiOx; bipolar switching modes; conductive filament; local redox reaction; resistance-change memory device; statistical distributions; unipolar switching mode; Bipolar switching; reset; resistance-change memory; titanium oxide (TiOx); unipolar switching;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2009.2021001
Filename
4982706
Link To Document