DocumentCode :
918898
Title :
Vacuum UV Radiation of a Plasma Jet Operated With Rare Gases at Atmospheric Pressure
Author :
Lange, Hartmut ; Foest, Rüdiger ; Schäfer, Jan ; Weltmann, Klaus-Dieter
Author_Institution :
Leibniz Inst. for Plasma Sci. & Technol., Greifswald
Volume :
37
Issue :
6
fYear :
2009
fDate :
6/1/2009 12:00:00 AM
Firstpage :
859
Lastpage :
865
Abstract :
The vacuum ultraviolet (VUV) emissions from 115 to 200 nm from the effluent of an RF (1.2 MHz) capillary jet fed with pure argon and binary mixtures of argon and xenon or krypton (up to 20%) are analyzed. The feed gas mixture is emanating into air at normal pressure. The Ar2 excimer second continuum, observed in the region of 120-135 nm, prevails in the pure Ar discharge. It decreases when small amounts (as low as 0.5%) of Xe or Kr are added. In that case, the resonant emission of Xe at 147 nm (or 124 nm for Kr, respectively) becomes dominant. The Xe2 second continuum at 172 nm appears for higher admixtures of Xe (10%). Furthermore, several N I emission lines, the O I resonance line, and H I line appear due to ambient air. Two absorption bands (120.6 and 124.6 nm) are present in the spectra. Their origin could be unequivocally associated to O2 and O3. The radiance is determined end-on at varying axial distance in absolute units for various mixtures of Ar/Xe and Ar/Kr and compared to pure Ar. Integration over the entire VUV wavelength region provides the integrated spectral distribution. Maximum values of 2.2 mW middotmm-2middotsr-1 are attained in pure Ar and at a distance of 4 mm from the outlet nozzle of the discharge. By adding diminutive admixtures of Kr or Xe, the intensity and spectral distribution is effectively changed.
Keywords :
discharges (electric); plasma jets; plasma radiofrequency heating; RF capillary jet; atmospheric pressure; discharge; nozzle; plasma jet; rare gases; vacuum UV radiation; Atmospheric pressure plasma jet (APPJ); microdischarges; vacuum ultraviolet (VUV) radiation;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2009.2019982
Filename :
4982716
Link To Document :
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