DocumentCode :
919209
Title :
Photoresponses of MOS transistor
Author :
Okamoto, K. ; Mochizuki, Marie
Volume :
59
Issue :
9
fYear :
1971
Firstpage :
1351
Lastpage :
1352
Abstract :
Illumination effects on the drain current were studied for a p-channel enhancement-type MOS transistor, and the results show that the photoresponses are mainly due to electron excitation in the conduction band from surface states lying near the top of the valence band. It also appears that the hole density of the channel decresses in the vicinity of the drain region but is almost constant over the entire channel when more than 200 µm away from the drain edge.
Keywords :
Aluminum; Capacitance-voltage characteristics; Electrodes; Electrons; Lighting; MOSFETs; Oxidation; Photoconductivity; Silicon; Threshold voltage;
fLanguage :
English
Journal_Title :
Proceedings of the IEEE
Publisher :
ieee
ISSN :
0018-9219
Type :
jour
DOI :
10.1109/PROC.1971.8413
Filename :
1450343
Link To Document :
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