DocumentCode :
91945
Title :
Nonquasi-Static Charge Model for Common Double-Gate MOSFETs Adapted to Gate Oxide Thickness Asymmetry
Author :
Sharan, Neha ; Mahapatra, Santanu
Author_Institution :
Dept. of Electron. Syst. Eng., Indian Inst. of Sci., Bangalore, India
Volume :
60
Issue :
7
fYear :
2013
fDate :
Jul-13
Firstpage :
2419
Lastpage :
2422
Abstract :
With the unique quasi-linear relationship between the surface potentials along the channel, recently we have proposed a quasi-static terminal charge model for common double-gate MOSFETs, which might have asymmetric gate oxide thickness. In this brief, we extend this concept to develop the nonquasi-static (NQS) charge model for the same by solving the governing continuity equations. The proposed NQS model shows good agreement against TCAD simulations and appears to be useful for efficient circuit simulation.
Keywords :
MOSFET; semiconductor device models; NQS charge model; asymmetric gate oxide thickness; circuit simulation; double-gate MOSFET; gate oxide thickness asymmetry; nonquasistatic charge model; quasilinear relationship; quasistatic terminal charge model; surface potential; Compact modeling; double-gate (DG) MOSFET; nonquasi-static (NQS) effect;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2013.2262943
Filename :
6525382
Link To Document :
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