DocumentCode :
920790
Title :
Effects of boron density on radiation resistance of copper-contaminated n/p type silicon solar cells
Author :
Kato, Yukio ; Usami, Akira
Author_Institution :
Nagoya Institute of Technology, Department of Electornics, Nagoya, Japan
Volume :
9
Issue :
2
fYear :
1973
Firstpage :
18
Lastpage :
19
Abstract :
The radiation-resistance properties of copper-contaminated n/p type cells are observed only when the copper concentration is larger than the boron density in the bulk region of the cells. The values of ¿(1/L2) on n/p type cells are not always proportional to the boron density in the bulk region.
Keywords :
boron; copper; semiconductor doping; solar cells; boron density effect; copper doped n/p type; radiation resistance; semiconductor doping; solar cells;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19730013
Filename :
4235948
Link To Document :
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