DocumentCode :
921019
Title :
Integrated optical NOR gate
Author :
Beyette, F.R., Jr. ; Geib, K.M. ; Feld, S.A. ; An, X. ; Hafich, M.J. ; Robinson, G.Y. ; Wilmsen, C.W.
Author_Institution :
Dept. of Electr. Eng., Colorado State Univ., Fort Collins, CO, USA
Volume :
4
Issue :
4
fYear :
1992
fDate :
4/1/1992 12:00:00 AM
Firstpage :
390
Lastpage :
392
Abstract :
A two-input optical NOR gate structure is proposed and demonstrated. The NOR gate is fabricated from a vertically integrated heterojunction phototransistor and light emitting diode InGaAs-InP structure grown by gas source molecular beam epitaxy. Operation up to 500 kHz is demonstrated for devices fabricated with 250- mu m*250- mu m mesas. Analysis indicates that operation at frequencies up to 50-100 MHz is possible for smaller mesa areas. ON/OFF optical contrast ratios as high as 30 were measured.<>
Keywords :
III-V semiconductors; bipolar integrated circuits; gallium arsenide; indium compounds; integrated optoelectronics; light emitting diodes; molecular beam epitaxial growth; optical logic; phototransistors; semiconductor technology; 50 to 100 MHz; InGaAs-InP; ON/OFF optical contrast ratios; gas source molecular beam epitaxy; light emitting diode; optical logic gate; semiconductor; two-input optical NOR gate structure; vertically integrated heterojunction phototransistor; Gold; Integrated optics; Light emitting diodes; Logic devices; Molecular beam epitaxial growth; Optical bistability; Optical devices; Optical interconnections; Optical sensors; Stimulated emission;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/68.127224
Filename :
127224
Link To Document :
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