Title :
3-GHz 15-W Silicon Bipolar Transistors
Author :
Uchizaki, Ichiro ; Hori, Shigekazu ; Oda, Yuji ; Tomita, Naotaka
fDate :
12/1/1979 12:00:00 AM
Abstract :
Silicon bipolar transistors delivering 15-W CW output power with 4.8-dB gain and 38-percent collector efficiency have been developed at 3 GHz. The transistors have been fabricated by boron ion implantation for base region and arsenic diffusion from doped polysilicon for emitter region. Chemical dry-etching techniques for fine patterning and internal-matching techniques have been applied.
Keywords :
Bipolar transistors; Boron; Costs; Electrons; Gallium arsenide; Ion implantation; Microwave transistors; Power generation; Silicon; Solid state circuits;
Journal_Title :
Microwave Theory and Techniques, IEEE Transactions on
DOI :
10.1109/TMTT.1979.1129788