DocumentCode :
923741
Title :
Model of a metal-oxide-silicon transistor operating in the saturation region
Author :
Rossel, P. ; Martinot, H.
Author_Institution :
CNRS, Laboratoire d´Automatique et d´Analyse des Systÿmes, Toulouse, France
Volume :
9
Issue :
18
fYear :
1973
Firstpage :
414
Lastpage :
416
Abstract :
The output resistance of an m.o.s. transistor operating in the saturation region is studied experimentally and theoretically. New experimental properties of the `resistance¿current¿ product are described. A model is proposed in which the structure is divided into two sections. In the source section, a gradual length approximation is assumed, taking into account the mobility¿field dependence; while in the drain section, the mobile-carrier charge is included in the `equivalent doping¿. The continuity conditions between the two regions are described. Good agreement is found between the theory and the experimental results.
Keywords :
field effect transistors; resistance (electric); semiconductor device models; field effect transistors; metal insulator semiconductor devices; resistance; saturation region; semiconductor device models;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19730304
Filename :
4236254
Link To Document :
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