Title : 
Microwave performance of GaAs MOSFET with wet thermally oxidized InAlP gate dielectric
         
        
            Author : 
Cao, Yijia ; Li, X. ; Zhang, Juyong ; Fay, P. ; Kosel, T.H. ; Hall, D.C.
         
        
            Author_Institution : 
Dept. of Electr. Eng., Univ. of Notre Dame, IN, USA
         
        
        
        
        
            fDate : 
5/1/2006 12:00:00 AM
         
        
        
        
            Abstract : 
This paper reports the first demonstration of a microwave-frequency operation of a GaAs MOSFET fabricated using a wet thermal oxidization of InAlP lattice-matched to GaAs to form a native-oxide gate insulator. Devices with 1-μm gate lengths exhibit a cutoff frequency (fT) of 13.7 GHz and a maximum frequency of oscillation (fmax) of 37.6 GHz, as well as a peak extrinsic transconductance of 73.6 mS/mm. A low-leakage current density of 3.8×10/sup -3/ A/cm2 at 1-V bias for an MOS capacitor demonstrates the good insulating properties of the /spl sim/ 11-nm thick native gate oxide.
         
        
            Keywords : 
III-V semiconductors; MOS capacitors; MOSFET; aluminium compounds; dielectric materials; gallium arsenide; indium compounds; leakage currents; microwave field effect transistors; oxidation; 1 V; 1 micron; 11 nm; 13.7 GHz; 37.6 GHz; GaAs-InAlP; MOS capacitor; MOSFET; gate dielectric; insulating properties; leakage current; microwave FET; microwave performance; wet thermal oxidization; Cutoff frequency; Dielectrics and electrical insulation; Gallium arsenide; Leakage current; MOSFET circuits; Metal-insulator structures; Microwave devices; Oxidation; Transconductance; Wet etching; Gallium arsenide; InAlP native oxide; MOSFETs; microwave FETs; oxidation;
         
        
        
            Journal_Title : 
Electron Device Letters, IEEE
         
        
        
        
        
            DOI : 
10.1109/LED.2006.872898