DocumentCode :
925376
Title :
Design and fabrication of scanning near-field microwave probes compatible with atomic force microscopy to image embedded nanostructures
Author :
Tabib-Azar, Massood ; Wang, Yaqiang
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Case Western Reserve Univ., Cleveland, OH, USA
Volume :
52
Issue :
3
fYear :
2004
fDate :
3/1/2004 12:00:00 AM
Firstpage :
971
Lastpage :
979
Abstract :
Design, fabrication, and characterization of near-field microwave scanning probes compatible with an atomic force microscope (AFM) for imaging of embedded nanostructures are discussed. The microwave probe discussed here bridges the frequency gap between the existing local probe microscopy systems, and enables localized microwave spectroscopy and imaging of molecules and nanostructures. The probe consists of a coaxially shielded heavily doped silicon tip, and an aluminum (Al) coplanar waveguide. The coaxial tip structure was formed by a thick photoresist and plasma etching process, enabling the silicon apex to protrude through a well-defined aperture in the Al layer. Using this technique, probes with 10-μm-high coaxial tips of 5-nm apex radius and 500-nm aperture radius were realized. The aperture confines the electromagnetic fields in the exposed tip region, allowing microwave measurements with high spatial resolution. The mechanical and electrical characterizations of the microwave probes were performed to ensure their compliance with the requirement of an AFM, as well as that of the microwave measurements. Finally, simultaneous AFM and microwave imaging of standard AFM samples with grid structures was performed for the first time. The lateral spatial resolution of the microwave scans was approximately 50 nm at 2.8 GHz, compared to 100 nm for the AFM scans. The ability of the microwave signal to penetrate inside the sample opens new possibilities in hyperspectral and multimodal imaging of nanostructures. Correlations between AFM images and the microwave images enable proper registration and referencing of the microwave properties to landmarks in the topographic AFM images.
Keywords :
UHF measurement; atomic force microscopy; microwave imaging; nanotechnology; photolithography; probes; silicon-on-insulator; sputter etching; 2.8 GHz; SOI; atomic force microscopy; cantilever beams; coaxial probes; contact mode topography; embedded nanostructures imaging; fabrication; hyperspectral imaging; microwave imaging; multimodal imaging; photolithography; plasma etching; probes design; scanning local probe microscopy; scanning near-field microwave microscope; scanning near-field microwave probes; Apertures; Atomic force microscopy; Coaxial components; Fabrication; Microwave imaging; Nanostructures; Plasma confinement; Plasma measurements; Probes; Silicon;
fLanguage :
English
Journal_Title :
Microwave Theory and Techniques, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9480
Type :
jour
DOI :
10.1109/TMTT.2004.823596
Filename :
1273740
Link To Document :
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