Title :
Ge-nanoclusters embedded in Ge-doped silica-on-silicon waveguides
Author :
Ou, H. ; Rordam, T.P. ; Rottwitt, K. ; Grumsen, F. ; Horsewell, A.
Author_Institution :
COM. DTU, Tech. Univ. of Denmark, Lyngby, Denmark
fDate :
4/27/2006 12:00:00 AM
Abstract :
Ge-nanoclusters were formed by electron-beam irradiation in Ge-doped silica-on-silicon thin films. The size and density of the clusters can be controlled by the irradiation intensity and time.
Keywords :
electron beam applications; germanium; integrated optics; nanostructured materials; optical glass; optical waveguides; thin films; SiO2-Si:Ge; electron-beam irradiation; germanium nanoclusters; silica-on-silicon thin films; silica-on-silicon waveguides;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:20060399
