DocumentCode :
927642
Title :
Tunnel transistor
Author :
Kisaki, Hitoshi
Author_Institution :
Fujitsu Limited, Kobe, Japan
Volume :
61
Issue :
7
fYear :
1973
fDate :
7/1/1973 12:00:00 AM
Firstpage :
1053
Lastpage :
1054
Abstract :
A tunnel transistor which can be easily obtained by the conventional silicon planar technology will be proposed. It promises fine control of electrical characteristics and high yield. The yield per one wafer in the wafer checking has amounted to 100 percent.
Keywords :
Convolvers; Electric variables; Electrodes; Electron emission; Insulation; Metal-insulator structures; Semiconductor devices; Silicon; Tunneling; Voltage;
fLanguage :
English
Journal_Title :
Proceedings of the IEEE
Publisher :
ieee
ISSN :
0018-9219
Type :
jour
DOI :
10.1109/PROC.1973.9205
Filename :
1451135
Link To Document :
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