Title :
Electron optical system for microfabrication with 10 000 lines per field
Author :
Jones, Geb A. C. ; Ahmed, Hameeza ; Nixon, W.C.
Author_Institution :
Cambridge University, Department of Engineering, Cambridge, UK
Abstract :
An electron-beam system for use in microfabrication is described. Postlens deflection coils have been used with dynamic correction of the final lens to obtain an electron optical resolving power of about 10 000 lines over a 1 × 1 cm field.
Keywords :
electron beam applications; electron optics; integrated circuit production; 10000 lines per field; dynamic correction; electron optical system; microfabrication; postlens deflection coils; resolving power;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19750164
