• DocumentCode
    927792
  • Title

    Electron optical system for microfabrication with 10 000 lines per field

  • Author

    Jones, Geb A. C. ; Ahmed, Hameeza ; Nixon, W.C.

  • Author_Institution
    Cambridge University, Department of Engineering, Cambridge, UK
  • Volume
    11
  • Issue
    10
  • fYear
    1975
  • Firstpage
    214
  • Lastpage
    216
  • Abstract
    An electron-beam system for use in microfabrication is described. Postlens deflection coils have been used with dynamic correction of the final lens to obtain an electron optical resolving power of about 10 000 lines over a 1 × 1 cm field.
  • Keywords
    electron beam applications; electron optics; integrated circuit production; 10000 lines per field; dynamic correction; electron optical system; microfabrication; postlens deflection coils; resolving power;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19750164
  • Filename
    4236679
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=927792