DocumentCode :
927798
Title :
Transistor Forming Effects in n-Type Germanium
Author :
Valdes, L.B.
Author_Institution :
Bell Telephone Laboratories, Murray Hill Laboratory, Murray Hill, N.J.
Volume :
40
Issue :
4
fYear :
1952
fDate :
4/1/1952 12:00:00 AM
Firstpage :
445
Lastpage :
448
Abstract :
Some of the effects of electrical forming of the collector of an n-type germanium transistor are discussed. Evidence is presented for the existence of a region of p-type germanium underneath the formed electrode, together with some indication of the size of the formed region. These experiments lend support to the p-n hook mechanism in that they explain the observed high values of alpha in transistors. This relation is discussed.
Keywords :
Electrodes; Energy states; Etching; Germanium; Grain boundaries; Laboratories; Micromanipulators; Probes; Rectifiers; Surface resistance;
fLanguage :
English
Journal_Title :
Proceedings of the IRE
Publisher :
ieee
ISSN :
0096-8390
Type :
jour
DOI :
10.1109/JRPROC.1952.274038
Filename :
4050968
Link To Document :
بازگشت