DocumentCode :
928370
Title :
A model for the thermal degeneration of a positive optical photoresist
Author :
Carroll, Thomas A. ; Johnson, Brian W. ; Ramirez, W.Fred
Author_Institution :
Storage Technol. Corp., Louisville, CO, USA
Volume :
39
Issue :
4
fYear :
1992
fDate :
4/1/1992 12:00:00 AM
Firstpage :
777
Lastpage :
781
Abstract :
Positive optical photoresists have been used extensively in the semiconductor industry and in the manufacture of thin-film disk- and tape-drive heads. Mathematical models for the exposure and development phases of the lithography process have been well defined, but scant information on modeling of the pre-bake phase is available. A pre-bake model which describes the deterioration of the photoactive component in a positive optical resist is derived. A mass balance and the kinetics of the situation are used to describe the change in the Dill exposure model parameters. Experimental verification of the model is shown with three photoresists whose parameters are calculated for different wavelengths of light. The effect of the resist solvent on the exposure model parameters is discussed
Keywords :
light absorption; optical constants; photochemistry; photoresists; AZ4620; Dill exposure model parameters; absorption coefficient; kinetics; lithography process; mass balance; model; photoactive component deterioration; positive optical photoresist; pre-bake phase; resist solvent; thermal degeneration; Electronics industry; Kinetic theory; Lithography; Mathematical model; Optical devices; Optical films; Resists; Semiconductor device manufacture; Semiconductor thin films; Solvents;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.127465
Filename :
127465
Link To Document :
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