• DocumentCode
    928421
  • Title

    Electron field emission from copper with various thicknesses of oxide film

  • Author

    Heylen, A.E.D. ; Guile, A.E. ; Morgan, D.V.

  • Author_Institution
    University of Leeds, Department of Electrical & Electronic Engineering, Leeds, UK
  • Volume
    131
  • Issue
    2
  • fYear
    1984
  • fDate
    3/1/1984 12:00:00 AM
  • Firstpage
    111
  • Lastpage
    117
  • Abstract
    A new, nondestructive method for electron field emission measurement is presented, which, in principle, completely avoids the need for deleterious multiple sparking of the surface required by previous workers and which allows electron field emission to be measured at its origin; i.e. with only a few electrons leaving the cathodes per second. The results obtained on oxide-covered copper cathodes with various controlled thicknesses differ markedly from those obtained by previous workers and conform more with modern interpretation.
  • Keywords
    copper; electron detection and measurement; electron field emission; oxide coated cathodes; Cu cathode; electron field emission measurement; nondestructive method; oxide coated cathode; oxide film;
  • fLanguage
    English
  • Journal_Title
    Physical Science, Measurement and Instrumentation, Management and Education - Reviews, IEE Proceedings A
  • Publisher
    iet
  • ISSN
    0143-702X
  • Type

    jour

  • DOI
    10.1049/ip-a-1.1984.0017
  • Filename
    4646076