Title :
Influence of the channel width on the threshold voltage modulation in m.o.s.f.e.t.s
Author_Institution :
Chalmers University of Technology, Research Laboratory of Electronics, Gothenburg, Sweden
Abstract :
The threshold vollage of an m.o.s. field-effect transistor is modulated by the source-to-substrate reverse bias. In the letter, the theory for long- and short-channel transistors is extended to include the influence of the channel width. The result is an analytical expression for the threshold voltage as a function of geometry and bias that agrees well with experimental data.
Keywords :
field effect transistors; MOSFET; channel width; threshold voltage modulation;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19750225