DocumentCode
928451
Title
Influence of the channel width on the threshold voltage modulation in m.o.s.f.e.t.s
Author
Jeppson, K.O.
Author_Institution
Chalmers University of Technology, Research Laboratory of Electronics, Gothenburg, Sweden
Volume
11
Issue
14
fYear
1975
Firstpage
297
Lastpage
299
Abstract
The threshold vollage of an m.o.s. field-effect transistor is modulated by the source-to-substrate reverse bias. In the letter, the theory for long- and short-channel transistors is extended to include the influence of the channel width. The result is an analytical expression for the threshold voltage as a function of geometry and bias that agrees well with experimental data.
Keywords
field effect transistors; MOSFET; channel width; threshold voltage modulation;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19750225
Filename
4236744
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