DocumentCode :
928451
Title :
Influence of the channel width on the threshold voltage modulation in m.o.s.f.e.t.s
Author :
Jeppson, K.O.
Author_Institution :
Chalmers University of Technology, Research Laboratory of Electronics, Gothenburg, Sweden
Volume :
11
Issue :
14
fYear :
1975
Firstpage :
297
Lastpage :
299
Abstract :
The threshold vollage of an m.o.s. field-effect transistor is modulated by the source-to-substrate reverse bias. In the letter, the theory for long- and short-channel transistors is extended to include the influence of the channel width. The result is an analytical expression for the threshold voltage as a function of geometry and bias that agrees well with experimental data.
Keywords :
field effect transistors; MOSFET; channel width; threshold voltage modulation;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19750225
Filename :
4236744
Link To Document :
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