• DocumentCode
    928451
  • Title

    Influence of the channel width on the threshold voltage modulation in m.o.s.f.e.t.s

  • Author

    Jeppson, K.O.

  • Author_Institution
    Chalmers University of Technology, Research Laboratory of Electronics, Gothenburg, Sweden
  • Volume
    11
  • Issue
    14
  • fYear
    1975
  • Firstpage
    297
  • Lastpage
    299
  • Abstract
    The threshold vollage of an m.o.s. field-effect transistor is modulated by the source-to-substrate reverse bias. In the letter, the theory for long- and short-channel transistors is extended to include the influence of the channel width. The result is an analytical expression for the threshold voltage as a function of geometry and bias that agrees well with experimental data.
  • Keywords
    field effect transistors; MOSFET; channel width; threshold voltage modulation;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19750225
  • Filename
    4236744