DocumentCode :
930153
Title :
A 2-D boundary element method approach to the simulation of DMOS transistors
Author :
Zhou, Ming-Jiang ; De Smet, Herbert ; De Bruycker, Anita ; Van Calster, André
Author_Institution :
Lab. of Electron., Ghent Univ., Belgium
Volume :
12
Issue :
6
fYear :
1993
fDate :
6/1/1993 12:00:00 AM
Firstpage :
810
Lastpage :
816
Abstract :
A boundary element method is introduced for the calculation of two-dimensional potential and electric field distributions in high-voltage DMOS transistors. An algorithm is proposed to determine the dimensions of the depletion layers in two-dimensional geometries. Regions with different permittivities are taken into account using appropriate boundary conditions. As an application, the high-voltage behavior of the DMOS transistors is investigated, and the avalanche breakdown conditions of the transistors are determined by calculating the ionization integral. The results are compared with simulations based on finite difference methods
Keywords :
boundary-elements methods; boundary-value problems; digital simulation; electric fields; electronic engineering computing; impact ionisation; insulated gate field effect transistors; power transistors; semiconductor device models; 2D boundary element method; BEM; DMOS transistors; DMOST; FET; HV devices; avalanche breakdown conditions; boundary conditions; depletion layers; electric field distributions; high-voltage behavior; ionization integral; potential distribution; simulation; two-dimensional geometries; Avalanche breakdown; Boundary conditions; Boundary element methods; Electric potential; Finite difference methods; Finite element methods; Geometry; Helium; Integral equations; Poisson equations;
fLanguage :
English
Journal_Title :
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
Publisher :
ieee
ISSN :
0278-0070
Type :
jour
DOI :
10.1109/43.229755
Filename :
229755
Link To Document :
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