Title :
Calculation of one-dimensional lithographic aerial images using the vector theory
Author_Institution :
IBM, Hopewell Junction, NY, USA
fDate :
9/1/1993 12:00:00 AM
Abstract :
The vector theory is developed and employed to calculate 1-D aerial images by numerically solving Maxwell´s equations to account for the scattering effect from realistic mask structures. Comparisons of results from the scalar and vector theories are made for conventional chrome mask and various phase shifting masks to show the differences of these two theories
Keywords :
photolithography; vectors; Maxwell´s equations; chrome mask; one-dimensional lithographic aerial images; optical lithographic images; phase shifting masks; realistic mask structures; scattering effect; vector theory; Coherence; Helium; Light scattering; Lighting; Maxwell equations; Modems; Optical diffraction; Optical imaging; Optical scattering; Phase shifters;
Journal_Title :
Electron Devices, IEEE Transactions on
