• DocumentCode
    935312
  • Title

    Tape automated bonding inner lead bonded devices (TAB/ILB) failure analysis

  • Author

    Tung, Chih-Hang ; Kuo, Yen-Shu ; Chang, Shih-Ming

  • Author_Institution
    Electron. Res. & Service Organ., Ind. Technol. Res. Inst., Hsinchu, Taiwan
  • Volume
    16
  • Issue
    3
  • fYear
    1993
  • fDate
    5/1/1993 12:00:00 AM
  • Firstpage
    304
  • Lastpage
    310
  • Abstract
    Tape automated bonding inner lead bonded (TAB/ILB) devices were stressed by environmental tests and the subsequent failure analysis was performed. Two interesting failure mechanisms were observed, one is lead beam fracture after temperature cycling. It was observed to initiate at the intermetallics formed between Cu, lead and its tin plating layer during temperature cycling. The other mechanism is diffusion penetration of Ti-W barrier alloy by Au and Al interdiffusion. The penetration reaction includes nucleation, growth, and coalescence. Al hillocks were observed to be the nucleation sites. The result of this work can be applied in modifying bumping and inner lead bonding processes
  • Keywords
    chemical interdiffusion; circuit reliability; environmental testing; failure analysis; tape automated bonding; Al interdiffusion; Au interdiffusion; TAB linear lead bonded devices; TiW barrier alloy; coalescence; diffusion penetration; environmental tests; failure analysis; failure mechanisms; hillocks; lead beam fracture; nucleation; temperature cycling; Aluminum; Bonding; Capacitive sensors; Electrons; Failure analysis; Gold alloys; Packaging; Performance evaluation; Temperature; Testing;
  • fLanguage
    English
  • Journal_Title
    Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0148-6411
  • Type

    jour

  • DOI
    10.1109/33.232057
  • Filename
    232057