• DocumentCode
    935769
  • Title

    New method of registration for electron-beam lithography

  • Author

    Ahmed, Hameeza ; Hoare, R.D.

  • Author_Institution
    Cambridge University, Engineering Department, Cambridge, UK
  • Volume
    12
  • Issue
    1
  • fYear
    1976
  • Firstpage
    28
  • Lastpage
    29
  • Abstract
    A method of pattern registration for use in electron-beam lithography is described in the letter. The beam energy is reduced by a retarding field during the location of a pattern position, and the resist is unexposed. Patterns may be joined without any registration marks.
  • Keywords
    electron beam applications; photolithography; beam energy; electron beam lithography; pattern registration; retarding field;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19760021
  • Filename
    4239566
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=935769