DocumentCode
937135
Title
Design of sealed cavity microstructures formed by silicon wafer bonding
Author
Huff, Michael A. ; Nikolich, Alex D. ; Schmidt, Martin A.
Author_Institution
MIT, Cambridge, MA, USA
Volume
2
Issue
2
fYear
1993
fDate
6/1/1993 12:00:00 AM
Firstpage
74
Lastpage
81
Abstract
Three fabrication issues related to the design and fabrication of micromechanical devices using sealed cavities within bonded silicon wafers are discussed. The first concerns the resultant residual gas pressure within a sealed cavity between two bonded wafers after bonding and a high-temperature anneal. The second concerns the prediction of plastic deformation in capping layers of single-crystal silicon over sealed cavities. Exposure of sealed cavity structures to a high-temperature environment causes the trapped residual gas to expand, which can result in the plastic deformation of the capping layer. A model for analytically predicting the occurrence of plastic deformatio in these silicon capping layers has been developed. The third fabrication issue concerns the prediction of the resultant height of plastically deformed capping layers of silicon after cooling. A model which gives a lower and an upper bound on the height, based on an analytical spherical shell membrane stress equation, has been developed
Keywords
annealing; micromechanical devices; plastic deformation; semiconductor device models; wafer bonding; Si wafer bonding; capping layers; fabrication; height bounds; high-temperature anneal; model; plastic deformation; residual gas pressure; sealed cavity microstructures; single-crystal Si; spherical shell membrane stress equation; Annealing; Cooling; Deformable models; Fabrication; Micromechanical devices; Microstructure; Plastics; Predictive models; Silicon; Wafer bonding;
fLanguage
English
Journal_Title
Microelectromechanical Systems, Journal of
Publisher
ieee
ISSN
1057-7157
Type
jour
DOI
10.1109/84.232603
Filename
232603
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